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Sign Up to ReadInternship - Machine Learning and image-based metrics for EUV system setup
Introduction
ASML US, including its affiliates and subsidiaries, bring together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, Netherlands and we have 18 office locations around the United States including main offices in Chandler, Arizona, San Jose and San Diego, California, Wilton, Connecticut, and Hillsboro, Oregon.
Your Assignment
In ASML EUV Light Sources, high power lasers interact with Sn material to create the Plasma that generates EUV light. Achieving the correct alignment between the lasers and the Sn material is essential for efficient and stable operation. High-speed camera images captured during EUV formation contain valuable spatial information about this interaction. Your goal will be to develop image-based Key Performance Indicator (KPIs) that describe the alignment between lasers and Sn material. .
Key Idea and Deliverables
You will apply machine learning, and image analysis techniques to high-speed images collected during controlled experiments. The objective is to identify image characteristics that reliably indicate good laser-to-Sn alignment, and translate them into simple, measurable KPIs.
The project will involve:
Collecting and organizing high-speed image data from controlled experiments
Extract relevant image features using a mix of conventional image-processing techniques and/or explore ML/AI methods
Develop one or more image-based KPIs that summarize the relevant information
Validate the propose KPIs against performance measurements, and their robustness across different operating conditions
Success Criteria
Identification of image-based KPIs that show clear, repeatable trends with laser and Sn material alignment quality and demonstrate improved observability compared to current methodology in use on EUV sources. .
Your Profile
Must be pursuing a bachelor's or master's degree in computer science, control systems, physics, applied mathematics, or a related technical field.
Knowledge or experience using Python for data analysis.
Familiar with ML/AI-based image analysis methods.
Ability to analyze technical data and communicate findings and recommendations.
From the office
No visa sponsorship
ASML
Offices in San Diego, United States, United States
Also hiring in Netherlands, Berlin, Germany, San Jose, United States and 1 more place
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